SENTECH invitation to the annual seminar on “Plasma-Process-Technology”
SENTECH offers an application oriented seminar on the topic “Plasma-Process-Technology” on March 9, 2017 at SENTECH in Berlin Adlershof. We are glad to announce that invited speakers from industry and science will give presentations on plasma etching, PECVD and PEALD and share their experiences with different applications.
(IINews) - Current topics such as low-damage etching in sensor technology, deep silicon etching, deposition of multilayer systems with ALD and first results of layers deposited with spatial PEALD at standard pressure will be in focus. In addition, SENTECH Instruments employees present new developments in fields of vacuum clusters and applications.
For further information please download the full program here: Program SENTECH Plasma Seminar 2017 at our website.
After the seminar, all participants will be invited to visit SENTECH application laboratories and production facilities.
We are looking forward to welcome you at SENTECH headquarters in Berlin!
The SENTECH Seminar on „Plasma-Process-Technology” will take place at SENTECH Instruments, Schwarzschildstraße 2, Berlin-Adlershof, on Thursday, March 9, 2017. The registration fee is 238,00 € and includes lunch & beverages and the seminar materials.
Please send the Registration Form to SENTECH per fax no.: +49 89 8979607-22 or via email to sales(at)sentech.de. For further information see the SENTECH Plasma Seminar Invitation or please call us.
Themen in diesem Fachartikel:
plasma-etching
plasma-deposition
load-lock
pecvd
plasma-process-technology
etching
deposition
rie-etching
reactive-ion-etching
cvd
Unternehmensinformation / Kurzprofil:
SENTECH Instruments develops, manufactures, and globally sells innovative capital equipment centered on thin films in semiconductor technology, microsystems, photovoltaics, nanotechnology and materials research. SENTECH is expert in structuring and deposition of thin films by means of plasma process technology. SENTECH offers systems for plasma etching, plasma enhanced chemical vapour deposition, and atomic layer deposition. SENTECH provides innovative solutions for non-contact, non-invasive optical characterization using ellipsometry and reflectometry.
Founded in 1990, SENTECH is a reliable partner to industry and scientific institutions with leading edge equipment, global sales and service network.
Datum: 13.01.2017 - 11:56 Uhr
Sprache: Deutsch
News-ID 1444154
Anzahl Zeichen: 0
Kontakt-Informationen:
Ansprechpartner: P. Romanowski
Stadt:
Berlin
Telefon: +49 30 63 92 55 20
Kategorie:
Engineering
Anmerkungen:
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